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ArticleJ-GLOBAL ID:200902131037053006整理番号:99A0237790

Influence of developer temperature and resist material on the structure quality in deep x-ray lithography.

深X線リソグラフィーにおける構造品質への現像液の温度とレジスト材料の影響

著者:PANTENBURG F J(Forschungszentrum Karlsruhe, Karlsruhe, DEU)、ACHENBACH S(Forschungszentrum Karlsruhe, Karlsruhe, DEU)、MOHR J(Forschungszentrum Karlsruhe, Karlsruhe, DEU)
資料名:J Vac Sci Technol B 巻:16 号:6 ページ:3547-3551
発行年:1998年11月
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