Art
J-GLOBAL ID：200902131037053006   Reference number：99A0237790

Influence of developer temperature and resist material on the structure quality in deep x-ray lithography.

深X線リソグラフィーにおける構造品質への現像液の温度とレジスト材料の影響
Author (3)：
PANTENBURG F J

About PANTENBURG F J

(Forschungszentrum Karlsruhe, Karlsruhe, DEU)

About Forschungszentrum Karlsruhe, Karlsruhe, DEU

, 
ACHENBACH S

About ACHENBACH S

(Forschungszentrum Karlsruhe, Karlsruhe, DEU)

About Forschungszentrum Karlsruhe, Karlsruhe, DEU

, 
MOHR J

About MOHR J

(Forschungszentrum Karlsruhe, Karlsruhe, DEU)

About Forschungszentrum Karlsruhe, Karlsruhe, DEU


Material：
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)

About Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures


Volume： 16  Issue： 6  Page： 3547-3551  Publication year： Nov. 1998 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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hard X-ray

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,...
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Thesaurus term/Semi thesaurus term
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crosslinking

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JST classification (2)：
JST classification
Category name(code) classified by JST.
X-ray instruments and techniques 
(BA02060D)

About X-ray instruments and techniques

,  Manufacturing technology of solid-state devices 
(NC03030V)

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Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
X線リソグラフィー

About X線リソグラフィー

, 
現像液

About 現像液

, 
レジスト材料

About レジスト材料


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