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ArticleJ-GLOBAL ID:200902131042534292整理番号:97A0220043

On endpoint detection of plasma etching via optical emission interferometry.

発光干渉測定によるプラズマエッチングの終点検出

著者:WONG K S(MIT, MA)、BONING D S(MIT, MA)、SAWIN H H(MIT, MA)
資料名:Proc 11th Int Symp Plasma Process 1996 ページ:210-221
発行年:1996年
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