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ArticleJ-GLOBAL ID:200902131042779600整理番号:98A0506416

ウェーハ表面における金属不純物のXPSによる評価

XPS analysis of metalic impurity on Si surface.

著者:西川清子(富士通)、中村誠(富士通)、阿部直道(富士通)
資料名:応用物理学関係連合講演会講演予稿集 巻:45th 号:2 ページ:781
発行年:1998年03月
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