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ArticleJ-GLOBAL ID:200902131050089605整理番号:95A0708597

X-ray double crystal characterization of single crystal epitaxial aluminum nitride thin films on sapphire, silicon carbide and silicon substrates.

サファイア,炭化けい素およびシリコン基板上のエピタキシャル窒化アルミニウム単結晶膜のX線二結晶特性評価

著者:CHAUDHURI J(Wichita State Univ., Kansas)、THOKALA R(Wichita State Univ., Kansas)、EDGAR J H(Kansas State Univ., Kansas)・・・
資料名:J Appl Phys 巻:77 号:12 ページ:6263-6266
発行年:1995年06月15日
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