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ArticleJ-GLOBAL ID:200902131050757225整理番号:96A0725701

Side-selective and non-destructive determination of the critical current density of double-sided superconducting thin films.

両面に成膜した超伝導薄膜の臨界電流密度の側面選択性及び非破壊評価

著者:HOCHMUTH H(Univ. Leipzig, Leipzig, DEU)、LORENZ M(Univ. Leipzig, Leipzig, DEU)
資料名:Physica C 巻:265 号:3/4 ページ:335-340
発行年:1996年07月10日
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