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ArticleJ-GLOBAL ID:200902131051538551整理番号:98A0272565

Study of Pulsed Soft X-ray Source Employing a Gas-puff Z-pinch Plasma Device For Lithography Applications.

リソグラフィーアプリケーション用ガスパフZピンチプラズマ装置を使用するパルスソフトX線源の研究

著者:ZHANG G X(Nanyang Technological Univ., Singapore)、GUO X M(Nanyang Technological Univ., Singapore)、LUO C M(Tsinghua Univ., Beijing, CHN)・・・
資料名:AIP Conf Proc 号:409 ページ:423-426
発行年:1997年
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About J-GLOBAL

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