Art
J-GLOBAL ID：200902131052315793   Reference number：02A0276238

New Imaging Materials. 7. Photosensitive Organic Inorganic Materials.

新イメージグ材料 7. 感光性有機・無機ハイブリッド材料
Author (3)：
HANABATA MAKOTO

About HANABATA MAKOTO

(関西新技術研)

About 関西新技術研

, 
KATAYAMA JUNKO

About KATAYAMA JUNKO

(関西新技術研)

About 関西新技術研

, 
YAMAKI SHIGERU

About YAMAKI SHIGERU

(関西新技術研)

About 関西新技術研


Material：
日本印刷学会誌  (Journal of Printing Science and Technology)

About 日本印刷学会誌


Volume： 39  Issue： 1  Page： 55-61  Publication year： Jan. 31, 2002 
JST Material Number： G0233A  ISSN： 0914-3319  CODEN： NIGAEV  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
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silica

About silica


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

,  Photosensitive materials 
(ZA03020Q)

About Photosensitive materials

Terms in the title (2)：
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感光性

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, 
有機・無機ハイブリッド材料

About 有機・無機ハイブリッド材料


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