Art
J-GLOBAL ID：200902165033288256   Reference number：95A0121002

Photoresists based on a Novel Photorearrangement of o-Nitrobenzylic Polymers.

o-ニトロベンジル系高分子の新しい光転位に基づくフォトレジスト
Author (3)：
AJAYAGHOSH A

About AJAYAGHOSH A

(CSIR, Trivandrum, IND)

About CSIR, Trivandrum, IND

, 
GEORGE M V

About GEORGE M V

(CSIR, Trivandrum, IND)

About CSIR, Trivandrum, IND

, 
YAMAOKA T

About YAMAOKA T

(Fac. Engineering, Inage-ku, JPN)

About Fac. Engineering, Inage-ku, JPN


Material：
Journal of Materials Chemistry  (J Mater Chem)

About Journal of Materials Chemistry


Volume： 4  Issue： 12  Page： 1769-1773  Publication year： Dec. 1994 
JST Material Number： W0204A  ISSN： 0959-9428  CODEN： JMACEP  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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photoresist

About photoresist

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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ポジ型レジスト

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,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Other reactions of polymer 
(CG03040H)

About Other reactions of polymer

,  Polycondensation 
(CG04050Z)

About Polycondensation

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
ベンジル

About ベンジル

, 
高分子

About 高分子

, 
光転位

About 光転位

, 
フォトレジスト

About フォトレジスト


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