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ArticleJ-GLOBAL ID:200902165037764052整理番号:97A0502908

反応性スパッタリング法による酸化窒化Cr薄膜の歪み抵抗特性

Strain-Resistive Properties of chromium oxynitride thin Films Prepared by Reactive Sputtering.

著者:阪井淳(松下電工)、幡井崇(松下電工)、吉竹正明(大阪府産業技総研)・・・
資料名:応用物理学関係連合講演会講演予稿集 巻:44th 号:2 ページ:418
発行年:1997年03月
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