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ArticleJ-GLOBAL ID:200902165085942485整理番号:96A0636394

About the origin and the mechanisms involved in the cracking of highly porous silicon layers under capillary stresses.

毛細管応力がある時の多孔質シリコン層の亀裂の起源とメカニズム

著者:BELMONT O(Univ. Joseph Fourier (Grenoble I), Saint‐Martin d’Heres, FRA)、FAIVRE C(Univ. Joseph Fourier (Grenoble I), Saint‐Martin d’Heres, FRA)、BELLET D(Univ. Joseph Fourier (Grenoble I), Saint‐Martin d’Heres, FRA)・・・
資料名:Thin Solid Films 巻:276 号:1/2 ページ:219-222
発行年:1996年04月15日
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