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ArticleJ-GLOBAL ID:200902165109829693整理番号:00A0128231

Reaction rates for ionized physical vapor deposition modeling from molecular-dynamics calculations: Effect of surface roughness.

分子動力学計算によるイオン化物理蒸着モデリングに対する反応速度 表面粗さの影響

著者:HANSEN U(Massachusetts Inst. Technol., Massachusetts)、KERSCH A(Infineon AG, Muenchen, DEU)
資料名:Phys Rev B Condens Matter Mater Phys 巻:60 号:20 ページ:14417-14421
発行年:1999年11月15日
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