Removal of unsaturated contaminants from an industrial C<sub>4</sub>-stream using Cu/SiO<sub>2</sub> catalysts: Subsequent testing of the purified stream with an alkyne sensitive catalyst system.

SETIAWAN I; CAVELL K J

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J-GLOBAL ID：200902165142828279 Reference number：95A1025719

Removal of unsaturated contaminants from an industrial C₄-stream using Cu/SiO₂ catalysts: Subsequent testing of the purified stream with an alkyne sensitive catalyst system.

Cu/SiO₂触媒を用いる工業用C₄流からの不飽和汚染物質の除去アルキン感応触媒系を用いる精製流の引き続く純度試験

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Author (2)： ,
Material：
Volume： 131 Issue： 2 Page： 225-241 Publication year： Oct. 26, 1995
JST Material Number： D0691C ISSN： 0926-860X Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Catalytic reactions(heterogeneous system)

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Removal of unsaturated contaminants from an industrial C4-stream using Cu/SiO2 catalysts: Subsequent testing of the purified stream with an alkyne sensitive catalyst system.

Removal of unsaturated contaminants from an industrial C₄-stream using Cu/SiO₂ catalysts: Subsequent testing of the purified stream with an alkyne sensitive catalyst system.