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ArticleJ-GLOBAL ID:200902165214320453整理番号:01A0464912

Advanced Metrology for Rapid Characterization of the Thermal Mechanical Properties of Low-k Dielectric and Copper Thin Films.

低κ誘電体と銅薄膜の熱力学特性の迅速な特性化のための最新の計測方法

著者:LAU S H(Frontier Semiconductor, CA)、TOLENTINO E(Frontier Semiconductor, CA)、LIM Y(Frontier Semiconductor, CA)・・・
資料名:J Electron Mater 巻:30 号:4 ページ:299-303
発行年:2001年04月
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About J-GLOBAL

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