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ArticleJ-GLOBAL ID:200902212402052057整理番号:04A0365149

High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography

極端紫外線リソグラフィーのための高変換効率の質量限定Snベースレーザプラズマ源

著者:RICHARDSON M(Univ. Central Florida, Florida)、KOAY C‐S(Univ. Central Florida, Florida)、TAKENOSHITA K(Univ. Central Florida, Florida)・・・
資料名:J Vac Sci Technol B 巻:22 号:2 ページ:785-790
発行年:2004年03月
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