Art
J-GLOBAL ID:200902212406966649   Reference number:08A1072955

Fabrication of 0.5 nm electrode gaps using self-breaking technique

自己破壊法を用いた0.5nm電極ギャップの形成
Author (3):
Material:
Volume: 93  Issue: 16  Page: 163115  Publication year: Oct. 20, 2008 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

JST classification (1):
JST classification
Category name(code) classified by JST.
Other electric and electronic parts 
Terms in the title (3):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page