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ArticleJ-GLOBAL ID:200902212406966649整理番号:08A1072955

Fabrication of 0.5 nm electrode gaps using self-breaking technique

自己破壊法を用いた0.5nm電極ギャップの形成

著者:TSUTSUI Makusu(The Inst. of Scientific and Industrial Res., Osaka Univ., Ibaraki, Osaka 567-0047, JPN)、TANIGUCHI Masateru(The Inst. of Scientific and Industrial Res., Osaka Univ., Ibaraki, Osaka 567-0047, JPN)、KAWAI Tomoji(The Inst. of Scientific and Industrial Res., Osaka Univ., Ibaraki, Osaka 567-0047, JPN)
資料名:Appl Phys Lett 巻:93 号:16 ページ:163115
発行年:2008年10月20日
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