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ArticleJ-GLOBAL ID:200902212416524903整理番号:06A0693677

Effects of Processing Variables on Tantalum Nitride by Reactive-Ion-Assisted Magnetron Sputtering Deposition

反応性のイオン支援によるマグネトロンスパッタリング蒸着による窒化タンタルに及ぼす加工変数の効果

著者:WEI Chao‐Tsang(National Chiao‐Tung Univ., Hsinchu, TWN)、WEI Chao‐Tsang(Industrial Technol. Res. Inst., Chutung, TWN)、SHIEH Han‐Ping D.(National Chiao‐Tung Univ., Hsinchu, TWN)
資料名:Jpn J Appl Phys Part 1 巻:45 号:8A ページ:6405-6410
発行年:2006年08月15日
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About J-GLOBAL

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