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ArticleJ-GLOBAL ID:200902212424785830整理番号:03A0794549

Small angle x-ray scattering for sub-100 nm pattern characterization

100nm以下のパターンキャラクタリゼーションのための小角X線散乱

著者:JONES R L(NIST Polymers Div., Maryland)、HU T(NIST Polymers Div., Maryland)、LIN E K(NIST Polymers Div., Maryland)・・・
資料名:Appl Phys Lett 巻:83 号:19 ページ:4059-4061
発行年:2003年11月10日
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About J-GLOBAL

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The system enables searches of similar kinds of content through linkage with external sites.
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