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ArticleJ-GLOBAL ID:200902212426772158整理番号:09A0602270

DEVELOPMENT OF SKEWED DRIE PROCESS AND ITS APPLICATION TO ELECTROSTATIC TILT MIRROR

歪んだ深堀り反応性イオンエッチング(DRIE)プロセスの開発及び静電傾斜鏡への応用

著者:NAKADA M.(Univ. Tokyo, Tokyo, JPN)、TAKAHASHI K.(Univ. Tokyo, Tokyo, JPN)、TAKAHASHI T.(Univ. Tokyo, Tokyo, JPN)・・・
資料名:Tech Dig IEEE Micro Electro Mech Syst 巻:22nd Vol.2 ページ:1083-1086
発行年:2009年
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