About J-GLOBAL

日本語

Font size
  • A
  • A

Articleの詳細情報

ArticleJ-GLOBAL ID:200902212447632895整理番号:05A0267373

Interlayer-related paramagnetic defects in stacks of ultrathin layers of SiOx, Al2O3, ZrO2, and HfO2 on (100)Si

(100)Si上のSiOx,Al2O3,ZrO2,及びHfO2超薄膜から成る積層中の界面層に関連した常磁性欠陥

著者:STESMANS A(Univ. Leuven, Leuven, BEL)、AFANAS’EV V V(Univ. Leuven, Leuven, BEL)
資料名:J Appl Phys 巻:97 号:3 ページ:033510.1-033510.8
発行年:2005年02月01日
  • J-GLOBAL home
  • Bookmark J-GLOBAL

J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.