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ArticleJ-GLOBAL ID:200902212475643304整理番号:04A0399368

Effects of slurry filter size on the chemical mechanical polishing (CMP) defect density

化学機械研磨(CMP)欠陥密度に及ぼすスラリーフィルタサイズの影響

著者:SEO Y‐J(Daebul Univ., Chonnam‐Do, KOR)、KIM S‐Y(ANAM Semiconductor Co., Inc., Kyunggi‐do, KOR)、CHOI Y‐O(Chosun Univ., Gwangju, KOR)・・・
資料名:Mater Lett 巻:58 号:15 ページ:2091-2095
発行年:2004年06月
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About J-GLOBAL

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