Rchr
J-GLOBAL ID:200901092349858720   Update date: Apr. 18, 2024

Ishikawa Yasuhiko

イシカワ ヤスヒコ | Ishikawa Yasuhiko
Affiliation and department:
Job title: Research Assistant
Homepage URL  (1): http://www.int.ee.tut.ac.jp/photon/
Research field  (4): Optical engineering and photonics ,  Electronic devices and equipment ,  Electric/electronic material engineering ,  Crystal engineering
Research keywords  (5): epitaxial growth ,  photonic-electronic integration ,  photonic devices ,  silicon germanium ,  silicon photonics
Research theme for competitive and other funds  (33):
  • 2022 - 2025 高品質グラフェンとシリコンフォトニクスのヘテロ集積によるTHz-光融合
  • 2021 - 2024 On-wafer band engineering for Ge epitaxial layers selectively grown on Si
  • 2018 - 2021 Archtecture of plasmonic logic circuit
  • 2015 - 2020 光信号の低コスト受信モニタリングのための小型光位相同期回路の研究開発
  • 2016 - 2019 Formation of silicon/germanium photonics platform using bulk silicon wafers
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Papers (206):
  • Yasuhiko Ishikawa. Trench-filling heteroepitaxy of [100]-oriented germanium arrays on (001) silicon substrate. Japanese Journal of Applied Physics. 2024. 63. 3
  • Yasuhiko Ishikawa. Anti-relaxation of tensile lattice strain in Si-embedded Ge strip structure for photonic device applications. Japanese Journal of Applied Physics. 2024. 63. 3
  • Mohd Faiz Bin Amin, Jose A. Piedra-Lorenzana, Keisuke Yamane, Takeshi Hizawa, Tetsuya Nakai, Yasuhiko Ishikawa. High-quality Ge epitaxial film based on dislocation trapping mechanism in patterned Si substrate. Japanese Journal of Applied Physics. 2023. 63. 2
  • Junichi Fujikata, Masataka Noguchi, Riku Katamawari, Kyosuke Inaba, Hideki Ono, Daisuke Shimura, Yosuke Onawa, Hiroki Yaegashi, Yasuhiko Ishikawa. High-performance Ge/Si electro-absorption optical modulator up to 85°C and its highly efficient photodetector operation. Optics Express. 2023. 31. 6. 10732-10732
  • Kota Kato, Kazuki Motomura, Jose A. Piedra-Lorenzana, Mohd Faiz Bin Amin, Takeshi Hizawa, Tetsuya Nakai, Yasuhiko Ishikawa. Trench-Filling Epitaxy of Germanium on (001) Silicon Enhanced Using [100]-Oriented Patterns. Journal of Electronic Materials. 2023. 52. 8. 5066-5074
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MISC (255):
  • 前田匠海, 加藤滉大, PIEDRA-LORENZANA Jose A., 山根啓輔, 飛沢健, 中井哲弥, 石川靖彦. Effect of trench width on Ge epitaxial growth on Si. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
  • 古家聖輝, 葛谷樹矢, PIEDRA-LORENZANA Jose A., 飛沢健, 山根啓輔, 藤原弘康, 石川靖彦. Effect of Ge Epitaxial Interlayer on Solid-Phase Growth of Ge on Si. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
  • 金子尚平, PIEDRA-LORENZANA Jose A., 藤方潤一, 石川靖彦. Responsivity spectrum and temperature characteristics evaluation of waveguide-photodetector of Ge wire structure. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
  • 佐藤真希斗, 西依輝, PIEDRA-LORENZANA Jose A., 飛沢健, 石川靖彦. Epitaxial Growth of SiGe/Ge Layers for Photonic Integration on a Bulk Si Platform. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
  • 福島孝晃, LORENZANA Jose A. Piedra, 飛沢健, 石川靖彦. Low temperature reactive sputtering of AlN film for Si photonics applications. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2022. 83rd
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Patents (44):
Books (5):
  • 次世代高速通信に対応する光回路実装、デバイスの開発
    技術情報協会 2022
  • Photonics and Electronics with Germanium
    Wiley-VCH, Weinheim 2015
  • Silicon Photonics II (Topics in Applied Physics)
    Springer Verlag 2010
  • Optical Interconnects - The Silicon Approach
    Springer Verlag 2006
  • Silicon Nanoelectronics,
    Tayler & Francis 2005
Lectures and oral presentations  (392):
  • CVD Growth of SiGe Layer on Bulk Si for Optical Waveguide Application
    (Photonic Device Workshop 2023 (PDW2023) 2023)
  • Formation of TEOS-SiOx film by PECVD for Si Photonics Applications
    (Photonic Device Workshop 2023 (PDW2023) 2023)
  • Enhanced L- and U-band Responsivity in Lateral p-i-n Photodetectors of Ge Wire on Si
    (2023)
  • Characterization of Dark Current in Free-Space pin Photodetector of Strain-Enhanced Ge Layer on Si
    (Photonic Device Workshop 2023 (PDW2023) 2023)
  • UHV-CVDによるV溝パターンSi基板上へのGeエピタキシャル成長
    (第10回 応用物理学会名古屋大学スチューデントチャプター東海地区学術講演会 2023)
more...
Education (1):
  • - 1998 Hokkaido University Graduate School, Division of Engineering
Professional career (1):
  • (BLANK) (Hokkaido University)
Committee career (38):
  • 2023/04 - 現在 半導体の結晶成長と加工および評価に関する応物産学連携委員会 委員
  • 2019/06 - 現在 電子情報通信学会光集積及びシリコンフォトニクス特別研究専門委員会 委員
  • 2012 - 現在 電子材料シンポジウム プログラム委員
  • 2023/04 - 2025/03 応用物理学会東海支部 幹事
  • 2021/04 - 2023/03 応用物理学会東海支部 支部長補佐
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Association Membership(s) (5):
The Electrochemical Society ,  SPIE ,  IEEE ,  応用物理学会 ,  Material Research Society
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