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ArticleJ-GLOBAL ID:200902076499312324整理番号:91A0906147

Thermal stability of CoSi2 on single crystal and polycrystalline silicon.

著者:PHILLIPS J R(Cornell Univ., NY)、REVESZ P(Cornell Univ., NY)、OLOWOLAFE J O(Cornell Univ., NY)・・・
資料名:Polysilicon Thin Films Interfaces ページ:57-63
発行年:1990年
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About J-GLOBAL

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