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ArticleJ-GLOBAL ID:200902076638104766整理番号:92A0728458

同時接合工程による自己整合コバルトシリサイド及び薄い接合形成

A Study on the Self-Aligned Cobalt Silicidation and the Formation of a Shallow Junction by Concurrent Junction Process.

著者:LEE S W(Seoul Univ.)、MIN K I(Seoul Univ.)、JOO S K(Seoul Univ.)
資料名:J Korean Inst Telemat Electron A 巻:29 号:2 ページ:127-135
発行年:1992年02月
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