Art
J-GLOBAL ID：200902141421792288   Reference number：01A0059388

Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication.

ナノメートルパターン作製のためのフラーレン誘導体ナノ複合レジスト
Author (3)：
ISHII T

About ISHII T

(Tokyo Univ. Agriculture and Technol., Tokyo, JPN)

About Tokyo Univ. Agriculture and Technol., Tokyo, JPN

, 
TAMAMURA T

About TAMAMURA T

(NTT Basic Res. Lab., Kanagawa, JPN)

About NTT Basic Res. Lab., Kanagawa, JPN

, 
SHIGEHARA K

About SHIGEHARA K

(Tokyo Univ. Agriculture and Technol., Tokyo, JPN)

About Tokyo Univ. Agriculture and Technol., Tokyo, JPN


Material：
Japanese Journal of Applied Physics. Part 2. Letters  (Japanese Journal of Applied Physics. Part 2. Letters & Express Letters)

About Japanese Journal of Applied Physics. Part 2. Letters


Volume： 39  Issue： 10B  Page： L1068-L1070  Publication year： Oct. 15, 2000 
JST Material Number： F0599B  ISSN： 0021-4922  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
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All keywords is available on JDreamIII(charged).
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nanostructure

About nanostructure

,...
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JST classification (2)：
JST classification
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Thin films of organic compounds 
(BK14070L)

About Thin films of organic compounds

,  Manufacturing technology of solid-state devices 
(NC03030V)

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Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
作製

About 作製

, 
フラーレン誘導体

About フラーレン誘導体

, 
ナノ複合

About ナノ複合

, 
レジスト

About レジスト


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