Art

J-GLOBAL ID：201702241425446000   Reference number：17A0356604

Effects of N_2 /Ar Flow Ratio on Structure and Hardness of TiN Thin Films Deposited on Glass Substrates

ガラス基TIN膜の構造と硬度に及ぼすアルゴン流量比の影響を研究した。【JST・京大機械翻訳】

Author (6)： Gu Baobao (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology) ,  Zhao Qingnan (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology) ,  Liu Xu (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology) ,  Luo Leping (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology) ,  Cong Fangling (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology) ,  Zhao Xiujian (State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology)
Material： Guisuanyan Tongbao  (Bulletin of the Chinese Ceramic Society)
Volume： 35  Issue： 12  Page： 4076-4081  Publication year： 2016 
JST Material Number： C2439A  ISSN： 1001-1625  Document type： Article
Article type： 原著論文  Country of issue： China (CHN)  Language： CHINESE (ZH)

Abstract/Point： TiN thin films were deposited ...

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Thesaurus term： Nitrogen ,  microhardness ,  X-Ray Diffraction ,  crystal grain size ,  flow velocity ,  field emission ,  *hardness ,  preferred orientation ,  crystal orientation ,  scanning electron microscope ,  *Argon ,  phase constitution ,  surface morphology ,  glass substrate ,  *flow ratio

Author keywords (4)： magnetron sputtering ,  TiN films deposited the glass substrate ,  hardness ,  flow ratio of N_2 /Ar

JST classification (1)： Thin films of other inorganic compounds  (BK14060A)

Terms in the title (6)： ガラス ,  TiN膜 ,  硬度 ,  アルゴン ,  流量比 ,  研究