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J-GLOBAL ID：201702244256598594   Reference number：17A0356893

Dispersion Stability of CeO_2 Nano Particles Polishing Agent and Its Properties in Chemical Mechanical Polishing Process

CEO_2ナノ粒子の分散安定性と化学的機械的研磨特性を研究した。【JST・京大機械翻訳】

Author (4)： Chen Guanglin (School of Mechanical and Electrical Engineering, Central South University) ,  Liu Defu (School of Mechanical and Electrical Engineering, Central South University, State Key Laboratory of High Performance Complex Manufacturing) ,  Chen Tao (School of Mechanical and Electrical Engineering, Central South University, State Key Laboratory of High Performance Complex Manufacturing) ,  She Yixi (School of Mechanical and Electrical Engineering, Central South University)
Material： Biaomian Jishu
Volume： 45  Issue： 11  Page： 187-193  Publication year： 2016 
JST Material Number： C2656A  ISSN： 1001-3660  Document type： Article
Article type： 原著論文  Country of issue： China (CHN)  Language： CHINESE (ZH)

Abstract/Point： The work aims to prepare excel...

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Thesaurus term： slurry ,  dispersing agent ,  characterization ,  *nano particle ,  stabilizing action ,  silica glass ,  steric hindrance ,  particle size(ratio) ,  *polishing(machining) ,  ion ,  *chemical mechanical polishing ,  anion
Semi thesaurus term： イオン性 ,  紫外可視分光光度計 ,  *分散安定性 , 【Automatic Indexing@JST】

Author keywords (6)： polishing agent ,  dispersity ,  surfactant ,  chemical mechanical polishing ,  absorbancy ,  zeta potential

JST classification (1)： Colloid chemistry in general  (CB11010C)

Terms in the title (4)： ナノ粒子 ,  分散安定性 ,  化学的機械的研磨 ,  研究