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J-GLOBAL ID:201702282165392811   Reference number:17A0190502

Investigation of Photoresist Removal Process using Microwave Plasma in Water Vapor by Means of Optical Emission Spectroscopy

水蒸気雰囲下におけるマイクロ波励起プラズマによるレジスト膜除去プロセスの分光学的手法を用いた検討
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Material:
Volume: 34th  Page: ROMBUNNO.17pA5  Publication year: Jan. 16, 2017 
JST Material Number: L4449B  Document type: Proceedings
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
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Manufacturing technology of solid-state devices  ,  Plasma diagnostics 

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