Rchr
J-GLOBAL ID：201201099175895981
Update date: Mar. 04, 2021
Takada Akira
Takada Akira
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Affiliation and department：
Topcon Corporation
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Research field (1)：
Semiconductors, optical and atomic physics
Research keywords (1)：
包括脳ネットワーク
Papers (15)：
Masato Shibuya, Akira Takada, Toshiharu Nakashima. Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification with one-dimensional patterns. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. 2016. 15. 2
Akira Takada, Makoto Saika, Shigenori Nagano. Phase stabilization of an actively mode-locked ring laser. FIBER LASERS XII: TECHNOLOGY, SYSTEMS, AND APPLICATIONS. 2015. 9344
Masato Shibuya, Akira Takada, Toshiharu Nakashima. Comparing the Experimental Resist Pattern Width with Aerial Image Intensity in Resist in High NA Projection Lens. OPTICAL MICROLITHOGRAPHY XXVIII. 2015. 9426
Akira Takada, Makoto Saika, Shigenori Nagano. Effect of linewidth enhancement factor in actively mode-locked ring laser. FIBER LASERS XI: TECHNOLOGY, SYSTEMS, AND APPLICATIONS. 2014. 8961
Akira Takada, Makoto Fujino, Shigenori Nagano. Dispersion dependence of linewidth in actively mode-locked ring lasers. OPTICS EXPRESS. 2012. 20. 4. 4753-4762
ｍore...
MISC (12)：
Masato Shibuya, Kouhei Nogami, Akira Takada, Suezou Nakadate. Evaluating the performance of DP and EUVL by using analytical equations for resolution of optical lithography with considering required DOF. OPTICAL MICROLITHOGRAPHY XXIV. 2011. 7973. Pt.2. 79732Y.1-79732Y.9
高田聡. 限界に挑戦する最新リソグラフィー マスク検査技術-極限の検査で見えてくる光学系の不思議-. O plus E. 2010. 370. 1070-1074
Akira Takada, Masato Shibuya. Mask defect inspection by detecting polarization variations. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV. 2010. 7638. Pt.2. 76382Y.1-76382Y.8
TAKADA Akira. Control of Periodic Spatial Coherence by Fly-eyes in the Mask Inspection System. Tech Dig Int Conf Opt photonics Des Fabr. 2010. 7th. 421-422
Akira Takada, Toru Tojo, Masato Shibuya. Optimum optics for die-to-wafer-like image mask inspection. OPTICAL REVIEW. 2009. 16. 2. 59-65
ｍore...
Professional career (1)：
博士(工学) (東京工芸大学)
Association Membership(s) (2)：
SPIE
, IEEE
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