Rchr
J-GLOBAL ID:201301006746884663   Update date: Apr. 18, 2024

Ohdaira Keisuke

オオダイラ ケイスケ | Ohdaira Keisuke
Affiliation and department:
Homepage URL  (1): http://www.jaist.ac.jp/ms/labs/ohdaira/home.htm
Research field  (3): Material fabrication and microstructure control ,  Crystal engineering ,  Applied materials
Research keywords  (11): Catalytic chemical vapor deposition ,  太陽電池 ,  結晶化 ,  簿膜 ,  多結晶シリコン ,  フラッシュランプアニール ,  スパッタリング ,  熱処理 ,  高温加圧加工 ,  半導体結晶 ,  X線用レンズ
Research theme for competitive and other funds  (6):
  • 2020 - 2024 Realizing of long lifetime perovskite solar cells driven in air atmosphere
  • 2016 - 2019 Development of innovative fabrication technology for silicon solar cells using a novel low-temperature doping method
  • 2015 - 2018 Formation of polycrystalline silicon by explosive crystallization and its application to solar cells
  • 2011 - 2012 Development of the fabrication technology of next-generation polycrystalline silicon solar cells using rapid crystallization
  • 2009 - 2010 Formation of high-quality poly-Si films by rapid crystallization of sputtered a-Si films
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Papers (191):
  • Ryota Ohashi, Kentaro Kutsukake, Huynh Thi Cam Tu, Koichi Higashimine, Keisuke Ohdaira. High Passivation Performance of Cat-CVD i-a-Si:H Derived from Bayesian Optimization with Practical Constraints. ACS Applied Materials & Interfaces. 2024. 16. 7. 9428-9435
  • Deqin Wu, Huynh Thi Cam Tu, Keisuke OHDAIRA. Delay of the potential-induced degradation of n-type crystalline silicon photovoltaic modules by the prior application of reverse bias. Japanese Journal of Applied Physics. 2024. 63. 2. 02SP06-02SP06
  • Huynh Thi Cam Tu, Keisuke OHDAIRA. Long term stability of low temperature deposited Cat-CVD SiN x thin film against damp-heat stress. Japanese Journal of Applied Physics. 2024. 63. 1. 01SP25-01SP25
  • Hiroki Nakajima, Huynh Thi Cam Tu, Keisuke Ohdaira. Ultrathin Al-doped SiO x passivating hole-selective contacts formed by a simple wet process. Japanese Journal of Applied Physics. 2023. 62. SK. SK1040-SK1040
  • Shuntaro Shimpo, Huynh Thi Cam Tu, Keisuke Ohdaira. Potential-induced degradation of encapsulant-less p-type crystalline Si photovoltaic modules. Japanese Journal of Applied Physics. 2023. 62. SK. SK1039-SK1039
more...
MISC (55):
  • Y. Liu, H. T. C. Tu, N. Yamaguchi, K. Ohdaira. Silicon heterojunction solar cells with a counter-doped n-a-Si film treated by flash lamp annealing. Extended Abstract of the 2021 International Conference on Solid State Devices and Materials (SSDM 2021). 2021
  • J. Xu, H. T. C. Tu, A. Masuda, K. Ohdaira. Effect of temperature and pre-annealing on the potential-induced degradation of silicon heterojunction photovoltaic modules. Extended Abstract of the 2021 International Conference on Solid State Devices and Materials (SSDM 2021). 2021
  • Y. Wen, H. T. C. Tu, and K. Ohdaira. Hydrogenation on tunnel nitride passivated contacts by catalytically generated atomic hydrogen. Extended Abstract of the 2021 International Conference on Solid State Devices and Materials (SSDM 2021),. 2021
  • Dong Chung Nguyen, Yasuaki Ishikawa, Cong Thanh Nguyen, Keisuke Ohdaira, Atsushi Masuda, Yukiharu Uraoka. Influence of UV light on the increase of SiNx conductivity toward elucidation of potential induced degradation mechanism. Proceedings of 2019 IEEE 46th Photovoltaic Specialists Conference (PVSC). 2020. 317-320
  • Y. Xu, A. Masuda, K. Ohdaira. Influence of light illumination on the potential-induced degradation of n-type interdigitated back-contact crystalline Si photovoltaic modules. Extended Abstract of the 2020 International Conference on Solid State Devices and Materials (SSDM 2020). 2020
more...
Books (11):
  • 結晶シリコン太陽電池モジュールの電圧誘起劣化試験
    日本試験機工業会 広報誌「TEST」, Vol.71 2024
  • The Work Behind the Scenes for the First Ever Online Event of SSDM2020
    AAPPS Bulletin 32, Article number: 4 2022
  • ホッとひといき SSDM2020初のオンライン開催の舞台裏
    応用物理 第90巻, 第4号 2021
  • ホッとひといき 支部学術講演会を知ろう
    応用物理 第89巻, 第6号 2020
  • 今月のトピックス 展示ブースにお邪魔しました
    応用物理 第88巻, 第9号 2019
more...
Lectures and oral presentations  (745):
  • Cat-CVDで堆積した非晶質Si膜へのFLAにより形成した多結晶Si膜の低欠陥化
    (第71回応用物理学会春季学術講演会(東京都市大学) 2024)
  • 金属/超極薄AlドープSiOx接触により誘起したp型結晶Si表面でのキャリア選択パッシベーティングコンタクト
    (第71回応用物理学会春季学術講演会(東京都市大学) 2024)
  • SHJ太陽電池応用に向けたn-a-Siのベイズ最適化を用いた堆積条件探索
    (第71回応用物理学会春季学術講演会(東京都市大学) 2024)
  • カバーガラスをポリカーボネートで代替した曲面封止材無し結晶Si太陽電池モジュールの防水構造の改良
    (第71回応用物理学会春季学術講演会(東京都市大学) 2024)
  • 封止材とカバーガラスを使用しない曲面・大面積結晶Si太陽電池モジュールの試作
    (第71回応用物理学会春季学術講演会(東京都市大学) 2024)
more...
Professional career (1):
  • Ph.D. from The University of Tokyo
Work history (9):
  • 2018/10 - 現在 Japan Advanced Institute of Science and Technology
  • 2016/04 - 2018/09 Japan Advanced Institute of Science and Technology
  • 2012/01 - 2016/03 Japan Advanced Institute of Science and Technology
  • 2009/10 - 2013/03 Japan Science and Technology Agency
  • 2006/04 - 2011/12 Japan Advanced Institute of Science and Technology
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Awards (2):
  • 2017/11/17 - PVSEC-27 Technical Program Committee PVSEC-27 Best Paper Award
  • 2007/09/04 - The Japan Society of Applied Physics 第22回(2007年春季)応用物理学会講演奨励賞
Association Membership(s) (7):
International Conference on Hot-Wire Chemical Vapor Deposition (Cat-CVD) Process ,  薄膜材料デバイス研究会 ,  Active-Matrix Flatpanel Displays and Devices (AM-FPD) ,  International Conference on Solid State Devices and Materials (SSDM) ,  Cat-CVD研究会 ,  IEEE ,  The Japan Society of Applied Physics
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