Momose Takeshi

モモセタケシ | Momose Takeshi

Affiliation and department：
Job title： Professor
Homepage URL (1)： http://www.fpelab.cs.kumamoto-u.ac.jp

Research field (4)： Chemical reaction and process system engineering , Electronic devices and equipment , Thin-film surfaces and interfaces , Material fabrication and microstructure control

Research keywords (9)： Thin film , Process engineering , Reaction engineering , Material science and engineering , Semiconductor devices , Supercritical fluid , Supercritical fluid deposition , Atomic layer deposition , 化学気相堆積(CVD)

Papers (63)：

Jun Yamaguchi, Noboru Sato, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. Atomic Layer Deposition of Cobalt Film from Dicobalt-hexacarbonyl-tert-butylacetylene and Hydrogen. ECS Journal of Solid State Science and Technology. 2023. 12. 11. 114003-114003
Momoko Deura, Takuya Nakahara, Wan Chi Lee, Takeshi Momose, Yoshiaki Nakano, Masakazu Sugiyama, Yukihiro Shimogaki. Effect of layer structure of AlN interlayer on the strain in GaN layers during metal-organic vapor phase epitaxy on Si substrates. Journal of applied physics. 2023. 133. 16
Kohei Shima, Yuhei Otaka, Noboru Sato, Yuichi Funato, Yasuyuki Fukushima, Takeshi Momose, Yukihiro Shimogaki. Kinetic Study on Heterogeneous Nucleation and Incubation Period during Chemical Vapor Deposition. The Journal of Chemical Physics. 2023. 158. 12. 124704-1-12
Yuyuan Huang, Momoko Deura, Yusuke Shimoyama, Yukihiro Shimogaki, Takeshi Momose. Supercritical fluid deposition for conformal Cu film formation on sub-millimeter-scale structures used to fabricate terahertz waveguides. Applied physics express. 2022. 15. 7
Noboru Sato, Yasuyuki Fukushima, Kohei Shima, Yuichi Funato, Takeshi Momose, Mitsuo Koshi, Yukihiro Shimogaki. Identifying the mechanism of formation of chlorinated silane polymer by-products during chemical vapor infiltration of SiC from CH3SiCl3/H2. International journal of chemical kinetics. 2022. 54. 5. 300-308

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MISC (239)：

Haonan Liu, Yuxuan Wu, Jun Yamaguchi, Noboru Sato, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. “Development of Molybdenum Atomic Layer Deposition Process for Next Generation ULSI Interconnect”. 2023
Shunsuke Kimura, Jun Yamaguchi, Noboru Sato, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. “In Situ observation of initial stage of Cobalt ALD using reflected light measurement”. 2023
Jun Yamaguchi, Noboru, Sato, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. “Examination of Co-ALD;process using;CCTBA precursor”. 2023
Yuxuan Wu, Jun Yamaguchi, Noboru Sato, Haonan Liu, Atsuhiro Tsukune, Takeshi Momose, Yukihiro Shimogaki. “Study of Cu precursors Adsorption Behavior on Cu (111) Surface by Density Functional Theory”. 2023
Yubin Deng, Takeshi Momose, Yukihiro Shimogaki. “Investigation of oxidation impact on Cu diffusivity in ultra-thin PVD-Co(W) films”. 2023

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Books (5)：

高圧力の科学・技術事典
朝倉書店 2022 ISBN:9784254102970
薄膜作製応用ハンドブック
エヌ・ティー・エス 2020 ISBN:9784860436315
最新実用真空技術総覧 = New practical vacuum technology
エヌ・ティー・エス 2019 ISBN:9784860435592
超臨界流体を用いる合成と加工
シーエムシー出版 2017 ISBN:9784781312682
超臨界流体技術の開発と応用
シーエムシー出版 2014 ISBN:9784781308906

Lectures and oral presentations (19)：

Supercritical fluid deposition for semiconductors
(The Society of Chemical Engineering, Japan, 89th annual Meeting (international session) 2024)
超臨界流体薄膜堆積法の基礎と半導体応用
(公益社団法人新化学技術推進協会 2024)
半導体集積地熊本での薄膜プロセス研究
(化学工学会東北支部夏季セミナー 2023)
タイムラグ法を用いた極薄PVD-Co(W)薄膜の定量的バリア性評価
(電子情報通信学会シリコン材料・デバイス研究会 2022)
超臨界流体薄膜堆積法(SCFD):速度論からデバイス応用まで
(化学工学会第52回秋季大会 2021)

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Professional career (1)：

Ph.D (Eng.) (The University of Tokyo)

Work history (7)：

2024/04 - 現在 Kumamoto University Research and Education Institute for Semiconductors and Informatics Professor
2023/04 - 2024/03 Kumamoto University Research and Education Institute for Semiconductors and Informatics Associate Professor
2016/04 - 2023/03 The University of Tokyo The Graduate School of Engineering Lecturer
2011/07 - 2016/03 The University of Tokyo The Graduate School of Engineering Assistant Professor
2011/04 - 2011/06 The University of Tokyo The Graduate School of Engineering Project Assistant Professor

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Committee career (19)：

2023 - 現在化学工学会エレクトロニクス部会幹事
2023 - 現在化学工学会超臨界流体部会部会連携委員
2022 - 現在応用物理学会シリコンテクノロジー分科会幹事
2022 - 現在応用物理学会シリコンテクノロジー分科会多層配線システム研究委員会委員
2021 - 現在電気化学会電子材料委員会監事

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Awards (4)：

2024/03 - 化学工学会 2023年度化学工学会部会活動貢献賞(部会CT賞) 超臨界流体部会における部会活動の企画、運営と活性化への顕著な貢献
2012/03 - 化学工学会平成23年度化学工学会研究奨励賞(内藤雅喜記念賞) 超臨界流体を用いた金属薄膜堆積プロセスの構築
2011/09 - 化学工学会CVD反応分科会平成23年度若手奨励賞超臨界Cu薄膜堆積プロセスの体系的理解に基づくウェハスケール反応器設計
2011/09 - Advanced Metallization Conference ADMETA Poster Award 2011 Mass Production Reactor design for Cu Interconnects on 12-inch Wafers Using Supercritical Fluid Deposition

Association Membership(s) (3)：

エレクトロニクス実装学会 , 応用物理学会 , 化学工学会

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