Eriguchi Koji

エリグチコウジ | Eriguchi Koji

Affiliation and department：
Homepage URL (1)： http://www.propulsion.kuaero.kyoto-u.ac.jp/

Research field (5)： Nanomaterials , Electronic devices and equipment , Material fabrication and microstructure control , Composite materials and interfaces , Basic plasma science

Research keywords (30)：プラズマプロセス , 誘電率 , 欠陥層 , 電気容量 , 分子動力学 , プラズマ , 欠陥 , 表面・界面 , ナノ材料 , レーザー , 変調反射率分光 , 誘電関数 , トランジスタ , 極低消費電力 , 界面層 , 電子 , 表面界面改質 , シリコン , プラズマ化学 , プラズマ加工 , 表面・界面物性 , 超微細加工形状 , 半導体超微細化 , 反応粒子輸送 , プラズマエッチング , 表面ラフネス , マイクロプラズマ , 亜音速・超音速流れ場 , エッチング , 高温反応場

Research theme for competitive and other funds (13)：

2021 - 2023 電子捕獲準位の誘電損失機構を活用したナノ薄膜の欠陥回復と信頼性向上に関する研究
2020 - 2023 パラメータ分離型アーク放電による窒化ホウ素膜のsp結合制御と機能設計の研究
2017 - 2019 Reliability evaluation and characteristic prediction in microfluidic devices applying stochastic process of random fluctuation problem
2016 - 2019 Study of defect generation processes in nano-scale devices and the deign methodology based on stochastic theory
2015 - 2018 Study of structure modification of boron nitride films by plasma exposure - the effect of ion energy distribution function

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Papers (155)：

Keiichiro Urabe, Minami Toyoda, Yoshinori Matsuoka, Koji Eriguchi. Investigation of small-fraction molecular impurities in high-pressure helium plasmas using optical plasma diagnostic methods. Plasma Sources Science and Technology. 2024. 33. 2. 025011-025011
Junki Morozumi, Takahiro Goya, Tomohiro Kuyama, Koji Eriguchi, Keiichiro Urabe. In situ electrical monitoring of SiO₂/Si structures in low-temperature plasma using impedance spectroscopy. Japanese Journal of Applied Physics. 2023. 62. SI. SI1010-SI1010
Yoshihiro Sato, Satoshi Shibata, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami, Keiichiro Urabe, Koji Eriguchi. Predicting the effects of plasma-induced damage on p-n junction leakage and its application in the characterization of defect distribution. Journal of Vacuum Science & Technology B. 2022. 40. 6. 062209-062209
Seiya Kito, Keiichiro Urabe, Koji Eriguchi. Multi-harmonic analysis in a floating harmonic probe method for diagnostics of electron energy and ion density in low-temperature plasmas. Japanese Journal of Applied Physics. 2022. 61. 10. 106002-106002
T. Matsuda, T. Hamano, Y. Asamoto, M. Noma, M. Yamashita, S. Hasegawa, K. Urabe, K. Eriguchi. Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique. Japanese Journal of Applied Physics. 2022. 61. SI. SI1014-SI1014

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MISC (151)：

松田崇行, 濱野誉, 朝本雄也, 野間正男, 山下満, 長谷川繁彦, 占部継一郎, 江利口浩二. Structural Design of Boron Nitride Films Using Ion-Flux Controlling Reactive Plasma-Assisted Coating (RePAC) Technique. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
朝本雄也, 松田崇行, 濱野誉, 野間正男, 長谷川繁彦, 山下満, 占部継一郎, 江利口浩二. Control of Ion Flux to the Substrate in Material Processing with a Vacuum-Arc Discharge Considering Discharge Current Limitation Mechanisms. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2021. 82nd
Tatsuru Shirafuji, Keizo Kinoshita, Hiroshi Akatsuka, Koji Eriguchi, Takashi Ichikawa, Takanori Ichiki, Tatsuo Ishijima, Kenji Ishikawa, Kazuhiro Karahashi, Kazuaki Kurihara, et al. Dry Process FOREWORD. JAPANESE JOURNAL OF APPLIED PHYSICS. 2020. 59
占部継一郎, 住平透, 野間正男, 山下満, 長谷川繁彦, 江利口浩二. Mechanical properties and surface sputtering of boron nitride films prepared by a reactive plasma assisted coating method. 日本航空宇宙学会中部・関西支部合同秋期大会講演論文集(CD-ROM). 2019. 56th
Koji Eriguchi, Keiichiro Urabe. Plasma etching process for advanced CMOS and memory device fabrication. Oyo Butsuri. 2018. 87. 12. 895-901

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Books (9)：

最新実用真空技術総覧
(株)エヌ・ティー・エス, 2019 2019
先端CMOS/メモリデバイスにおけるプラズマ加工技術の現状と課題
応用物理第87巻第12号 2018
真空科学ハンドブック
株式会社コロナ社(日本真空学会編) 2018
プラズマプロセス技術
森北出版株式会社 2017
プラズマプロセスの新しい応用
ケミカルエンジニヤリング 2013

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Lectures and oral presentations (29)：

Plasma-Induced Damage: Modeling and Characterization
(2022 IEEE International Integrated Reliability Workshop (IIRW) 2022)
Plasma-induced damage
(2021 IEEE International Integrated Reliability Workshop (IIRW), Reliability Experts Forum 2021)
Comprehensive Characterization of Surface Modification Mechanisms in Boron Nitride Films Prepared by a Reactive Plasma-assisted Coating Technique
(2021)
Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS)
(2021)
Plasma-induced Damage-Modeling and Characterizations
(International Symposium on Semiconductor Manufacturing (ISSM 2020) 2020)

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Work history (3)：

2016/07 - 現在 Kyoto University Professor
2005/07 - 2016/06 Kyoto University
1991/04 - 2005/07 Panasonic

Committee career (26)：

2007 - 現在 IEEE IRPS-Process Integration subcommittee Chair (2007-2008), Management committee (2011-), Technical Program Chair (2022), General Chair (2024)
2004 - 現在 IEEE ICICDT-Conference Chair (2009), General Chair (2010), Tutorial Chair (2014, 2015), Secretary (2016-2018), Tutorial Chair (2021)
2021/03 - 2023/03 - -
2019 - 2020 - -
2017/04/01 - 2019/03/31 - -

2014 - - -

2011 - 2013 - -

2009 - 2012 - -

2010 - 2011 - -

2008 - 2010 IMEC PESM-International program committee

2008 - 2010 - -

2007 - 2008 - -

2008 - Plasma Etch and Strip in Microelectronics workshop International program committee

2008 - Int. Workshop on Dielectric Thin Films for Future Electron Devices, Science and Technology Program committee, Publication Chair (2011), Program committee (2013, 2015)

2007 - Dry Process Symposium Program committee, Publication Chair (2010), Executive committee (2011-2012, 2015)

2007 - IEEE International Reliability Physics Symposium subcommittee, Process Integration subcommittee Chair (2009), Management committee-Asia Liaison (2011-2012), -Secretary (2013), -Workshop chair (2014), -A/V chair (2015), -Presentation chair (2016), -Publicity-Asia (2017), -Registration chair (2018), -Publicity chair (2019), -Publication chair (2020), -Finance chair (2021)

2004 - 2005 IEEE IEDM-CMOS and Interconnect Reliability subcommittee member

2004 - 2005 IEEE International Electron Device Meeting CMOS and Interconnect Reliability subcommittee member

2000 - 2005 - -

2004 - 2004 Int. Conf. Solid State Device and Materials Executive committee

2004 - IEEE International Conference on IC Design and Technology Subcommittee (2004-), Conference Chair (2009), General Chair (2010), Tutorial Chair (2014, 2015), Secretary (2016-2018)

1999 - 2003 American Vacuum Society Plasma- and Process-Induced Damage (P2ID), Conference Chair (2003)

1999 - 2003 Symposium on Plasma- and Process-Induced Damage Committee (1999-2002), Conference Chair (2003)

2000 - 2002 - -

1999 - 1999 Silicon Nanoelectronics Workshop Program committee

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Awards (30)：

2022/10 - IEEE EDS Kansai Chapter MFSK Award
2022/03 - IEEE International Reliability Physics Symposium IEEE IRPS 2021 Technical Program AWARDS: BEST STUDENT PAPER
2021/11 - DPS 2019 Young Researcher Award
2021/11 - 42nd International Symposium on Dry Process (DPS2021) DPS 2019 Young Researcher Award
2021/09 - IEEE EDS Kansai Chapter IEEE EDS Kansai Chapter of the Year Award

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Association Membership(s) (5)：

THE JAPAN SOCIETY FOR AERONAUTICAL AND SPACE SCIENCES , THE VACUUM SOCIETY OF JAPAN , THE JAPAN SOCIETY OF APPLIED PHYSICS , AVS (American Vacuum Society) , IEEE (The Institute of Electrical and Electronics Engineers, Inc.): Electron Device Society, Reliability Society

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