Art

J-GLOBAL ID：201702238610709522   Reference number：17A0214145

A 300mm foundry HRSOI technology with variable silicon thickness for integrated FEM applications

統合FEM応用のための可変シリコン厚さ300mm鋳造HRSOI技術【Powered by NICT】

Author (12)： Toh Rui Tze (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Parthasarathy Shyam (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Sun Tao (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Zhang Shaoqiang (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Purakh Raj Verma (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Zhu Chao Song (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Nune Venkata Sudheer (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Wong Jen Shuang (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Govindarajan Madabusi (GLOBALFOUNDRIES Engineering Private Limited, 9th Floor, Manyata Embassy Business Park, Bangalore, India - 560045) ,  Yoo Yong Koo (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Chew Kok Wai (GLOBALFOUNDRIES, 60 Woodlands Industrial Park-D, Street-2, Singapore-738406) ,  Ang Diing Shenp (School of EEE, Nanyang Technological University, Nanyang Avenue, Singapore 639798)
Material： IEEE Conference Proceedings  (IEEE Conf Proc)
Volume： 2016  Issue： IEDM  Page： 2.4.1-2.4.4  Publication year： 2016 
JST Material Number： W2441A  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： A novel approach to technology...

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Thesaurus term： *casting(metal) ,  thin film ,  *silicon
Semi thesaurus term： デバイス設計 ,  パワーMOSFET ,  RFフロントエンド ,  システムオンチップ , 【Automatic Indexing@JST】

JST classification (1)： Transistors  (NC03070N)

Terms in the title (7)： 統合 ,  FEM ,  応用 ,  可変 ,  シリコン ,  厚さ ,  鋳造