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J-GLOBAL ID:201702280973337157   Reference number:17A0258093

Atomic diffusion and interface reaction during diffusion bonding of SiC / Ti under alternating electric field

SIC/TI拡散接合過程における原子拡散と界面反応【JST・京大機械翻訳】
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Volume: 48  Issue: 11  Page: 61-68  Publication year: 2016 
JST Material Number: W1450A  ISSN: 0367-6234  CODEN: HPKYAY  Document type: Article
Article type: 原著論文  Country of issue: China (CHN)  Language: CHINESE (ZH)
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Photochemistry in general  ,  Chemical treatment of sewage and wastewater  ,  Electrochemical reaction  ,  Physical analysis of inorganic compounds  ,  Inorganic compounds and elements in general  ,  Bases,metal oxides 
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