文献
J-GLOBAL ID:200902024719724610
整理番号:87A0272430
熱安定化したイオン注入により非晶化したシリコンの光学的性質
Optical properties of thermally stabilized ion implantation amorphized silicon.
著者 (9件):
FRIED M
(Central Research Inst. Physics, Budapest, HUN)
,
LOHNER T
(Central Research Inst. Physics, Budapest, HUN)
,
J<span style=text-decoration:overline>A ́</span>ROLI E
(Central Research Inst. Physics, Budapest, HUN)
,
V<span style=text-decoration:overline>I ́</span>ZKELETHY G
(Central Research Inst. Physics, Budapest, HUN)
,
K<span style=text-decoration:overline>O ́</span>TAI E
(Central Research Inst. Physics, Budapest, HUN)
,
B<span style=text-decoration:overline>I ́</span>R<span style=text-decoration:overline>O ́</span> A
(Tungsram Research Lab., Budapest, HUN)
,
<span style=text-decoration:overline>A ́</span>D<span style=text-decoration:overline>A ́</span>M J
(Tungsram Research Lab., Budapest, HUN)
,
SOMOGYI M
(Inst. Technical Physics, Budapest, HUN)
,
KERKOW H
(Humboldt Univ. Berlin, DDR)
資料名:
Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms
(Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms)
巻:
19/20
号:
2
ページ:
577-581
発行年:
1987年02月
JST資料番号:
H0899A
ISSN:
0168-583X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)