文献
J-GLOBAL ID:200902119199862145
整理番号:00A0957881
イオンビームアシスト蒸着によるTiO2-x膜の作成
TiO2-x films prepared by ion beam assisted deposition.
著者 (9件):
LI C
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
ZHENG Z
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
ZHANG F
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
YANG S
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
WANG H
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
CHEN L
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
ZHANG F
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
WANG X
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
,
LIU X
(Shanghai Inst. Metallurgy, Chinese Acad. Sci., Shanghai, CHN)
資料名:
Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms
(Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms)
巻:
169
ページ:
21-25
発行年:
2000年06月
JST資料番号:
H0899A
ISSN:
0168-583X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)