文献
J-GLOBAL ID:200902129816515135
整理番号:94A0116424
パルスマグネトロンスパッタ技術
Pulsed magnetron sputter technology.
著者 (6件):
SCHILLER S
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
,
GOEDICKE K
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
,
RESCHKE J
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
,
KIRCHHOFF V
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
,
SCHNEIDER S
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
,
MILDE F
(Fraunhofer Establishment for Electron Beams and Plasma Technology, Dresden, DEU)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
61
号:
1/3
ページ:
331-337
発行年:
1993年12月03日
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)