文献
J-GLOBAL ID:200902150250551154
整理番号:94A0139480
EL-4, a new generation electron-beam lithography system.
著者 (9件):
PFEIFFER H C
(IBM Microelectronics Division, New York)
,
DAVIS D E
(IBM Microelectronics Division, New York)
,
ENICHEN W A
(IBM Microelectronics Division, New York)
,
GORDON M S
(IBM Microelectronics Division, New York)
,
GROVES T R
(IBM Microelectronics Division, New York)
,
HARTLEY J G
(IBM Microelectronics Division, New York)
,
QUICKLE R J
(IBM Microelectronics Division, New York)
,
STICKEL W
(IBM Microelectronics Division, New York)
,
WEBER E V
(IBM Microelectronics Division, New York)
資料名:
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures
(Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures)
巻:
11
号:
6
ページ:
2332-2341
発行年:
1993年11月
JST資料番号:
E0974A
ISSN:
1071-1023
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)