文献
J-GLOBAL ID:200902177976140000
整理番号:01A0732073
Ni,Rh及びPt上に吸着したNOの幾何学及び電子構造のX線近吸収端微細構造(NEXAFS)と共鳴光電子分光による評価
Geometric and electronic structures of NO adsorbed on Ni, Rh and Pt studied by using near edge X-ray absorption fine structure(NEXAFS) and resonant photoemission spectroscopy.
著者 (6件):
SAITO T
(National Inst. Advanced Industrial Sci. and Technol.(AIST), Ibaraki, JPN)
,
IMAMURA M
(National Inst. Advanced Industrial Sci. and Technol.(AIST), Ibaraki, JPN)
,
MATSUBAYASHI N
(National Inst. Advanced Industrial Sci. and Technol.(AIST), Ibaraki, JPN)
,
FURUYA K
(Sci. Univ. Tokyo, Tokyo, JPN)
,
KIKUCHI T
(Sci. Univ. Tokyo in Yamaguchi, Yamaguchi, JPN)
,
SHIMADA H
(National Inst. Advanced Industrial Sci. and Technol.(AIST), Ibaraki, JPN)
資料名:
Journal of Electron Spectroscopy and Related Phenomena
(Journal of Electron Spectroscopy and Related Phenomena)
巻:
119
号:
1
ページ:
95-105
発行年:
2001年07月
JST資料番号:
D0266C
ISSN:
0368-2048
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)