文献
J-GLOBAL ID:200902180420029446
整理番号:93A0761694
Transparent and conductive GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method.
著者 (5件):
SATO H
(Kanazawa Inst. Technology, Ishikawa, JPN)
,
MINAMI T
(Kanazawa Inst. Technology, Ishikawa, JPN)
,
YAMADA E
(Kanazawa Inst. Technology, Ishikawa, JPN)
,
TAKATA S
(Kanazawa Inst. Technology, Ishikawa, JPN)
,
ISHII M
(Kanazawa Inst. Technology, Ishikawa, JPN)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
11
号:
4 Pt 1
ページ:
1422-1425
発行年:
1993年07月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)