文献
J-GLOBAL ID:200902186990510626
整理番号:03A0069775
極端紫外線リソグラフィー用の点回折干渉計の開発 設計,作製,及び評価
Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation.
著者 (6件):
OTAKI K
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
,
OTA K
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
,
NISHIYAMA I
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
,
YAMAMOTO T
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
,
FUKUDA Y
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
,
OKAZAKI S
(Assoc. Super-Advanced Electronics Technol.(ASET), Kanagawa, JPN)
資料名:
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures
(Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures)
巻:
20
号:
6
ページ:
2449-2458
発行年:
2002年11月
JST資料番号:
E0974A
ISSN:
1071-1023
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)