文献
J-GLOBAL ID:200902200454068506
整理番号:09A1274506
原子層蒸着によって成長した高k HfO2ゲート誘電体を持つ低電圧溶液処理nチャネル有機電界効果トランジスタ
Low-voltage solution-processed n-channel organic field-effect transistors with high-k HfO2 gate dielectrics grown by atomic layer deposition
著者 (4件):
TIWARI Shree Prakash
(Center for Organic Photonics and Electronics (COPE), School of Electrical and Computer Engineering, Georgia Inst. of ...)
,
ZHANG Xiao-hong
(Center for Organic Photonics and Electronics (COPE), School of Electrical and Computer Engineering, Georgia Inst. of ...)
,
POTSCAVAGE William J.
(Center for Organic Photonics and Electronics (COPE), School of Electrical and Computer Engineering, Georgia Inst. of ...)
,
KIPPELEN Bernard
(Center for Organic Photonics and Electronics (COPE), School of Electrical and Computer Engineering, Georgia Inst. of ...)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
95
号:
22
ページ:
223303
発行年:
2009年11月30日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)