文献
J-GLOBAL ID:200902204036057501
整理番号:06A0716295
HiSIM2:RF回路シミュレーション用最新MOSFETモデルの正確度
HiSIM2: Advanced MOSFET Model Valid for RF Circuit Simulation
著者 (18件):
MIURA-MATTAUSCH Mitiko
(Hiroshima Univ., Hiroshima, JPN)
,
SADACHIKA Norio
(Hiroshima Univ., Hiroshima, JPN)
,
NAVARRO Dondee
(Hiroshima Univ., Hiroshima, JPN)
,
SUZUKI Gaku
(Hiroshima Univ., Hiroshima, JPN)
,
SUZUKI Gaku
(Matsushita Electric Industrial Corp., Kyoto, JPN)
,
TAKEDA Youichi
(Hiroshima Univ., Hiroshima, JPN)
,
TAKEDA Youichi
(Sanyo Electric Corp., Osaka, JPN)
,
MIYAKE Masataka
(Hiroshima Univ., Hiroshima, JPN)
,
WARABINO Tomoyuki
(Hiroshima Univ., Hiroshima, JPN)
,
MIZUKANE Yoshio
(Hiroshima Univ., Hiroshima, JPN)
,
INAGAKI Ryosuke
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
,
EZAKI Tatsuya
(Hiroshima Univ., Hiroshima, JPN)
,
MATTAUSCH Hans Juergen
(Hiroshima Univ., Hiroshima, JPN)
,
OHGURO Tatsuya
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
,
IIZUKA Takahiro
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
,
TAGUCHI Masahiko
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
,
KUMASHIRO Shigetaka
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
,
MIYAMOTO Shunsuke
(Semiconductor Technol. Academic Res. Center, Yokohama, JPN)
資料名:
IEEE Transactions on Electron Devices
(IEEE Transactions on Electron Devices)
巻:
53
号:
9
ページ:
1994-2007
発行年:
2006年09月
JST資料番号:
C0222A
ISSN:
0018-9383
CODEN:
IETDAI
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)