文献
J-GLOBAL ID:200902204847798862
整理番号:08A0142122
自己集合単分子層ベース表面中性化により作製したジブロック共重合体ナノテンプレートを利用したハイブリッドナノ作製プロセス
Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization
著者 (7件):
KIM Su-jin
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
MAENG W. J.
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
LEE S. K.
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
PARK D. H.
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
BANG Sung Hwan
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
KIM Hyungjun
(Dep. of Materials Sci. and Engineering, Pohang Univ. of Sci. and Technol. (POSTECH), Pohang 790-784, KOR)
,
SOHN Byeong-hyeok
(Dep. of Chemistry, Seoul National Univ., Seoul 151-742, KOR)
資料名:
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures
(Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures)
巻:
26
号:
1
ページ:
189
発行年:
2008年01月
JST資料番号:
E0974A
ISSN:
1071-1023
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)