文献
J-GLOBAL ID:200902213483814661
整理番号:05A0535207
走査型非線形誘電顕微鏡法による縦型二重ゲート金属-酸化物-半導体電界効果トランジスタの極薄チャネル内におけるドーパントプロフィールの明示
Demonstration of Dopant Profiling in Ultrathin Channels of Vertical-Type Double-Gate Metal-Oxide-Semiconductor Field-Effect-Transistor by Scanning Nonlinear Dielectric Microscopy
著者 (7件):
MASAHARA Meishoku
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
HOSOKAWA Shinichi
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
MATSUKAWA Takashi
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
ENDO Kazuhiko
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
NAITOU Yuichi
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
TANOUE Hisao
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
SUZUKI Eiichi
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
資料名:
Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers
(Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers)
巻:
44
号:
4B
ページ:
2400-2404
発行年:
2005年04月30日
JST資料番号:
G0520B
ISSN:
0021-4922
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
日本 (JPN)
言語:
英語 (EN)