文献
J-GLOBAL ID:200902227660624216
整理番号:06A0005875
2ビームパルスレーザ蒸着Zn1-xCoxO薄膜の成長と特性評価
Growth and characterization of dual-beam pulsed-laser-deposited Zn1-xCoxO thin films
著者 (6件):
PENG Y. Z.
(Data Storage Inst. (DSI), DSI Building, 5 Engineering Drive 1, Singapore 117608 and Electrical and Computer ...)
,
LIEW T.
(Data Storage Inst. (DSI), DSI Building, 5 Engineering Drive 1, Singapore 117608 and Electrical and Computer ...)
,
CHONG T. C.
(Data Storage Inst. (DSI), DSI Building, 5 Engineering Drive 1, Singapore 117608 and Electrical and Computer ...)
,
SONG W. D.
(Data Storage Inst. (DSI), DSI Building, 5 Engineering Drive 1, Singapore 117608)
,
LI H. L.
(Electrical and Computer Engineering Dep., National Univ. of Singapore, Singapore 119260)
,
LIU W.
(Electrical and Computer Engineering Dep., National Univ. of Singapore, Singapore 119260)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
98
号:
11
ページ:
114909-114909-7
発行年:
2005年12月01日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)