文献
J-GLOBAL ID:200902232803842841
整理番号:05A0763830
立方対称的な孔配置および乱れた孔配置を持つ3次元の等方的な多孔質シリカ薄膜の誘電定数と弾性率に関する理論的な研究
Theoretical Investigation of Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements
著者 (11件):
MIYOSHI Hidenori
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
YAMADA Kazuhiro
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
KOHMURA Kazuo
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
FUJII Nobutoshi
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
MATSUO Hisanori
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
TANAKA Hirofumi
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
OKU Yoshiaki
(Assoc. Super-Advanced Electronics Technol. (ASET), Ibaraki, JPN)
,
SEINO Yutaka
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
HATA Nobuhiro
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
KIKKAWA Takamaro
(National Inst. Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
KIKKAWA Takamaro
(Hiroshima Univ., Hiroshima, JPN)
資料名:
Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers
(Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers)
巻:
44
号:
8
ページ:
5982-5986
発行年:
2005年08月15日
JST資料番号:
G0520B
ISSN:
0021-4922
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
日本 (JPN)
言語:
英語 (EN)