文献
J-GLOBAL ID:200902241459709036
整理番号:06A1031076
Pt/(Y,Tb)MnO3/HfO2/Si構造用HfO2層の小型化
Downsizing of HfO2 Layer for Pt/(Y,Yb)MnO3/HfO2/Si Structure
著者 (4件):
SUZUKI Kazuyuki
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Nagoya, JPN)
,
NISHIZAWA Kaori
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Nagoya, JPN)
,
MIKI Takeshi
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Nagoya, JPN)
,
KATO Kazumi
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Nagoya, JPN)
資料名:
Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers
(Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers)
巻:
45
号:
9B
ページ:
7332-7335
発行年:
2006年09月30日
JST資料番号:
G0520B
ISSN:
0021-4922
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
日本 (JPN)
言語:
英語 (EN)