文献
J-GLOBAL ID:200902242787430940
整理番号:07A0700261
完全酸化によりスパッタ蒸着HfO2膜を高める低温方法
Low-temperature method for enhancing sputter-deposited HfO2 films with complete oxidization
著者 (8件):
TSAI Chih-tsung
(Inst. of Electronics Engineering, National Tsing Hua Univ., HsinChu 300, Taiwan, Republic of China)
,
CHANG Ting-chang
(Dep. of Physics and Inst. of Electro-Optical Engineering, Center for Nanoscience and Nanotechnology, National Sun ...)
,
LIU Po-tsun
(Dep. of Photonics and Display Inst., National Chiao Tung Univ., 1001 Ta-Hsueh Rd., HsinChu 300, Taiwan, Republic of ...)
,
YANG Po-yu
(Dep. of Photonics and Display Inst., National Chiao Tung Univ., 1001 Ta-Hsueh Rd., HsinChu 300, Taiwan, Republic of ...)
,
KUO Yu-chieh
(Dep. of Photonics and Display Inst., National Chiao Tung Univ., 1001 Ta-Hsueh Rd., HsinChu 300, Taiwan, Republic of ...)
,
KIN Kon-tsu
(Energy and Environment Res. Laboratories, Industrial Technol. Res. Inst., Hsinchu 300, Taiwan, Republic of China)
,
CHANG Pei-lin
(Energy and Environment Res. Laboratories, Industrial Technol. Res. Inst., Hsinchu 300, Taiwan, Republic of China)
,
HUANG Fon-shan
(Inst. of Electronics Engineering, National Tsing Hua Univ., HsinChu 300, Taiwan, Republic of China)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
91
号:
1
ページ:
012109
発行年:
2007年07月02日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)