文献
J-GLOBAL ID:200902269970029266
整理番号:06A0156799
不揮発性メモリ応用に対するSrTiOx薄膜の可逆抵抗スイッチング
Reversible resistive switching of SrTiOx thin films for nonvolatile memory applications
著者 (5件):
CHOI Dooho
(Dep. of Materials Sci. and Engineering, Gwangju Inst. of Sci. and Technol. (GIST), Gwangju 500-712, KOR)
,
LEE Dongsoo
(Dep. of Materials Sci. and Engineering, Gwangju Inst. of Sci. and Technol. (GIST), Gwangju 500-712, KOR)
,
SIM Hyunjun
(Dep. of Materials Sci. and Engineering, Gwangju Inst. of Sci. and Technol. (GIST), Gwangju 500-712, KOR)
,
CHANG Man
(Dep. of Materials Sci. and Engineering, Gwangju Inst. of Sci. and Technol. (GIST), Gwangju 500-712, KOR)
,
HWANG Hyunsang
(Dep. of Materials Sci. and Engineering, Gwangju Inst. of Sci. and Technol. (GIST), Gwangju 500-712, KOR)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
88
号:
8
ページ:
082904-082904-3
発行年:
2006年02月20日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)