文献
J-GLOBAL ID:200902271083540848
整理番号:08A1072592
Ni-Alミクロ反応性含浸による多孔質金属間化合物厚膜の形成
Formation of Porous Intermetallic Thick Film by Ni-Al Microscopic Reactive Infiltration
著者 (3件):
OHMI Tatsuya
(Div. of Materials Sci. and Engineering, Graduate School of Engineering, Hokkaido Univ.)
,
HAYASHI Naoya
(Div. of Materials Sci. and Engineering, Graduate School of Engineering, Hokkaido Univ.)
,
IGUCHI Manabu
(Div. of Materials Sci. and Engineering, Graduate School of Engineering, Hokkaido Univ.)
資料名:
Materials Transactions
(Materials Transactions)
巻:
49
号:
11
ページ:
2723-2727 (J-STAGE)
発行年:
2008年
JST資料番号:
G0668A
ISSN:
1345-9678
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
日本 (JPN)
言語:
英語 (EN)